Tai Lin Hsieh has been selected as one of the Surtex International Student Design Competition winners! The competition, atply named designext, honors outstanding art and design students for their exceptional surface design work each year. This year, students were asked to create a collection of original designs to be used in an outdoor celebrations setting in the year 2012. They were encouraged to think ahead to future trends and technologies – and to really harness their creativity and drama. Tai will travel to New York City, along with three other winners, to attend the SURTEX conference in May, where the final judging will take place.
The Grand Prize winner will receive a $1,000 scholarship, a special mention on the SURTEX website for one year, and outstanding letters of recommendation to prospective employers.
Congratulations to Tai Lin Hsieh and good luck in New York!
Follow the jump to see the rest of the textiles!
